Abstract:
In the rapidly evolving field of semiconductor manufacturing, precise and efficient lithography
simulations are crucial for achieving maximum production yield. This white paper demonstrates
our expertise in conducting lithography simulations, focusing on key quantities such as aerial images,
critical dimensions, bossung plots, process windows, and Normalized Image Log-Slope (NILS).
By leveraging a commercial lithography simulation software and automating its processes via API
integration, we showcase our ability to deliver accurate and actionable insights. Each quantity is
defined and illustrated with figures generated by our simulations, highlighting their relevance in
modern semiconductor development. This paper underscores our commitment to innovation and
precision in the field of lithography.
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