PPE @ SPIE Advanced Lithography + Patterning 2025

PPE @ SPIE Advanced Lithography + Patterning 2025

SPIELitho – We’re Back!

🚀After our successful exhibition debut last year - we are happy to be back! This year we have 40% more workforce and 100% commitment to solve your computational lithography challenges. Make sure to visit us at 📌 booth #423 to learn more about us:

✔Optical Design for imaging and non-imaging

✔ Computational Lithography

✔ Mask3D Effects

✔ Aerial Imaging

✔ Meta Surfaces

✔ And more: www.ppe-jena.com

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📢 Don’t miss our talk! Join Dominik Schulz for his invited presentation: "Optimizing lithographic imaging: the interplay of optical aberrations and image performance metrics." (https://lnkd.in/gebd3RWB)📅 26 Feb 2025 | 8:20 AM - 8:40 AM | 📍 Convention Center, Grand Ballroom 220A

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We look forward to seeing you!

More on our work in this field: Automated lithography simulation workflows (white paper).

Want to talk about your project? Book a free scoping call.