Mask-3D (M3D) effects are a key limiter of imaging performance in EUV lithography and are expected to intensify with increasing numerical aperture (NA). We present a comparative study of M3D-induced imaging degradations in high- and prospective hyper-NA projection systems in the low-k1 regime, focusing on diffraction-order imbalances as the underlying mechanism. Using analytical two-beam interference arguments, we relate diffraction-order magnitudes and phase differences (as functions on the imaging pupil) and the resulting imbalance parameters to characteristic aerial-image signatures and their pupil-averaged manifestations, including best-focus shifts, contrast loss, and non-telecentricity (nTC) errors. We quantify the discussion using rigorous electromagnetic field simulations of EUV mask diffraction and compute pupil distributions for representative high- and hyper-NA configurations. The resulting comparison elucidates how M3D-induced imaging degradations may scale with NA.