In the fast-moving world of semiconductor manufacturing, precision is everything. At PPE, we automate computational lithography workflows and extract actionable insights from the simulated data. In our whitepaper, we demonstrate this with several fundamental examples:
• How we simulate aerial images and critical dimensions
• The role of Bossung plots and process windows in optimization
• Why Normalized Image Log-Slope (NILS) matters for precision
• The power of API-integrated simulation workflows using commercial software
• Real examples with detailed figures and data
This paper reflects our commitment to pushing the boundaries of photonics and semiconductor process innovation.
Get the whitepaper here